Zone Plate and X-Ray Optics
Enabling Nanotechnology

We offer state of the art design and fabrication of deep nanoscale, high-efficient X-ray and EUV optics including high resolution and high energy Fresnel zone plates and phase zone plates, nano-gratings, as well as calibration standards for microscopy applications. 

Our specialized fabrication capabilities include electron-beam lithography, nanoimprint lithography, nanoscale glass lithography, plasma etching, thin-film deposition, and extreme high aspect ratio electrochemical plating. We also offer the NanoSOI Process Technology (via CMC microsystems) for fabricating NEMS, terahertz and silicon photonic devices.