Silicon Photonics Fabrication
Our NanoSOI process enables researchers and industry professionals to rapidly prototype silicon photonic and MEMS devices. Devices are manufactured using a state-of-the-art electron beam lithography system. The next submission deadline will be Thursday May 3, 2018 – 6:00 PM MDT. We offer:
- Patterning on 220 or 300 nm SOI
- Oxide cladding deposition
- Options such as metallization
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