• Silicon Photonics Fabrication

    Our NanoSOI process enables researchers and industry professionals to rapidly prototype silicon photonic and MEMS devices. Devices are manufactured using a state-of-the-art electron beam lithography system. The next submission deadline is on December 30, 2016. We offer:

    • Patterning on 220 or 300 nm SOI
    • Oxide cladding deposition
    • Options such as metallization
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    Silicon Photonics Fabrication
  • Calibration Standards Calibration Standards

    Calibration standards from ANT provide essential measurement capabilities for beamlines with sub 20 nm features that include:

    • Nested Ls
    • Siemen star patterns
    • ANT NanoUSAF 1951 design
    • Custom logos and designs
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  • Zone Plate Optics

    State-of-the-art Fresnel zone plates for soft and hard X-ray energies. Applications for our zone plates include:

    • General spectro-microscopy
    • Ptychography
    • Phase contrast imaging
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    Zone Plate Optics